MVSystems designs, manufactures and supplies a wide range of single and multi-chamber thin film deposition equipment. In addition, various PECVD, HWCVD, and PVD chambers can be manufactured individually or equipped with existing cluster (star) or linear deposition systems according to user needs. MVSystems has strong capabilities and rich experience in manufacturing equipment for various R&D, pilot and small production. The equipment produced has been successfully used in universities, research institutes and companies in 23 countries around the world. Our company's engineering department can take the user's consideration to the greatest extent possible so that users can obtain the equipment they need most and at the right price.

As part of our equipment sales, we can also guarantee customers the best optoelectronic performance parameters for thin-film semiconductor materials, including amorphous silicon, nano-silicon (microcrystalline silicon), dielectric materials (such as silicon nitride and silicon oxide), and transparent conductive films.

Other Business

MVSystems has various R&D facilities and technical personnel, and has the ability to develop various optoelectronic thin film technologies.

Research and Development: It can provide services to universities, government research institutions and companies around the world.

OEM service: Using computer-controlled large area cluster (star) plasma glow discharge (PECVD)/sputtering systems, MV Systems can provide users with a variety of thin film materials and devices, including:

• Amorphous silicon intrinsic and doped (n+ and p+ type) films.
• Nano (or microcrystalline) silicon (intrinsic and doped) films.
• Dielectric materials (such as SiNx, SiOx).
• Transparent conductive films (such as ITO, AZO).
• Solar cells, amorphous silicon thin film transistors, electronic imaging and storage devices, etc.

R&D Facilities: A highly secure monitoring system is installed in the company's laboratory to monitor and handle various dangerous and toxic gases, such as silane.

(1) Large-area cluster-type thin film deposition system: The maximum substrate area can reach 30 cm × 40 cm, with 6 PECVD chambers (equipped with RF, VHF power supplies and pulse modulation function) and 1 dual-target sputtering system (equipped with DC and RF power supplies), as well as multi-wafer storage function. The entire operation can be controlled by computer.

(2) Thermal evaporation system is used to make metal electrodes.

(3) Solar cell test system: equipped with a xenon lamp light source that complies with the AM1.5G spectrum. It can be used to measure the light and dark IV curve and quantum efficiency of the cell. It can also be used to test the light and dark conductivity and γ parameters of various semiconductor films.

(4) Conductivity activation energy test system.

(5) Infrared spectrometer.

(6) Transmission and reflection measuring instrument for ultraviolet to infrared light, equipped with integrating sphere.

(7) Ellipsometer is used to measure film thickness and dielectric constant.

(8) Step profiler is used to measure film thickness.

(9) Optical emission spectrometer is used to monitor the plasma process in real time.

(10) Various light sources, filters, oscilloscopes, microscopes and other common laboratory instruments.