The equipment is suitable for evaluating and controlling epitaxial processes in semiconductor production and can be used on a variety of different materials, such as: Silicon, Germanium, III-V including III-Nitrides.
CVP21 The clean room and modular system design structure enable this system to measure the doping concentration distribution in semiconductor materials (structures, layers) efficiently and accurately. Select appropriate electrolyte to contact and corrode the material, so as to obtain the doping concentration distribution of the material . Capacitance voltage scanning and corrosion process are fully automatically controlled by software