• MProbe Vis Micro-spot Thin Film Thickness Optical Measuring Instrument
  • MProbe Vis Micro-spot Thin Film Thickness Optical Measuring Instrument

MProbe Vis Micro-spot Thin Film Thickness Optical Measuring Instrument

No.MProbe Vis
Most translucent or slightly absorbing films can be measured quickly and reliably: oxides, nitrides, photoresists, polymers, semiconductors (Si, aSi, polySi), hard coatings (SiC, DLC), polymer coatings (Paralene, PMMA, polyamide), thin metal films, etc.
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  • MProbe Vis Micro-spot Thin Film Thickness Optical Measuring Instrument
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MProbe Vis
Micro-point film thickness optical measuring instrument
MProbe makes you a measurement expert!

Most translucent or slightly absorbing films can be measured quickly and reliably: oxides, nitrides, photoresists, polymers, semiconductors (Si, aSi, polySi), hard coatings (SiC, DLC), polymer coatings (Paralene, PMMA, polyamide), thin metal films, etc.

MProbe System

Accuracy

0.01nm or 0.01%

Accuracy

0.2% or 1nm

stability

0.02nm or 0.03%

Spot size

Standard is 3mm, as low as 3μm

Sample size

From 1 mm

Thickness range: 15 nm-50 um
Wavelength range: 400nm -1100nm

LCD, FPD applications: ITO, cell gap, polyamide. Optical coatings: dielectric filter, hard coating, anti-reflection coating Semiconductors and electrolytes: oxides, nitrides, OLED stacks
Real-time measurement and analysis. Various multi-layered, thin, thick, independent and uneven layers.

Rich material library (More than 500 materials) – New materials can be easily added. Cauchy, Tauc-Lorentz, Cody-Lorentz, EMA, etc.
Flexible use: Research and development can be carried out on the operating table or on site via the Internet.
It can be easily connected to external systems using TCP or Modbus interface.

Measurement parameters: Thickness, optical constants, surface roughness.
Friendly and powerful interface: The measurement and analysis setup is simple.
Useful tools: Simulation and sensitivity analysis, background and scaling correction, connecting layers and materials, multi-sample measurements, dynamic measurements and production batch processing.


Measurement of 300 nm silicon oxide film Measurement and model data fitting

Main parameters

Original reflectance from silicon wafer. Signal maximum (16 bits).
Integration time: 10ms

Spectral range (nm)

400-1100

Spectrometer/Detector

Spectrometer F4, Si CCD 3600 pixels, 16-bit ADC,
Range 360-1100 nm

Spectral resolution

<2 nm (标准)
<1 nm (选项)

light source

Halogen lamp (Xe filled) 5W, CT 2800o
Use time: 10000 hrs

Reflectance detection

Optical fiber (7 fiber bundles),
400μm fiber core

Accuracy

<0.01 nm or 0.01%

Accuracy

<1nm或0.2%

weight

4 kg

size

8”x 10”x 4” (WxDxH)

power

100-250VAC, 50/60 Hz
20W



Measuring 500nm AlN. Measurement parameters: thickness and surface roughness. Conversion factor applied to correct distance for changed configuration.

Optional Hardware

-FLVis

Vis achromatic focusing lens. WD:35mm. Light board size: <0.5mm.

-LP500

Long pass filter, wavelength range below 500nm.
For measuring photoresist materials. (Other filters available)

-FD Holder

Sample holder facing downwards. For measuring transparent and flexible samples

-TO

Optional transmittance

-TO Switch

2-channel switch, combined measurement of reflectance and transmittance.

- 2oW

Change to 20W (CT 3100o, use time 2000hrs) Tungsten halogen lamp .

-HR

Upgrading the spectrometer resolution<1nm

-TR

5V TTL at input/output trigger. 1 external (input)
Trigger to start measurement, 6 output triggers

Software Options

-MOD

Remote control based on Modbus standard (TCP)

-CM

Different measurements with a specified number of measurements and/or delays

Shanghai Sales + Technical Support + After-sales Service Center
Rayscience Optoelectronic Innovation Co., Ltd

address: 4th Floor, Building 122, Lane 2338, No. 1 Duhui Road, Minhang District, Shanghai
Telephone:
021-34635258 021-34635259
fax:
021-34635260
E-mail:
saleschina@rayscience.com

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