Optical film thickness meter

USA Optical film thickness meter , widely used in the precise measurement of optical constants (n and k) and thickness of various thin films and coatings. The equipment has two working modes: online and offline. It is easy to operate and can complete measurement and data analysis within a few seconds. It is connected to the computer via USB.

The reflected light from the film surface or interface will interfere with the reflected light from the substrate. The occurrence of interference is related to the film thickness and refractive index, so the thickness of the film can be calculated. Optical interferometry is a non-destructive, accurate and fast optical film thickness measurement technology. Our thin film measurement system uses the principle of optical interference to measure film thickness.

application:
Semiconductors (photoresists, oxides and nitrides, etc.),
Liquid crystal display (ITO, Polyimide, Cell gap),
forensics, biofilms and materials;
inks, minerals, dyes, cosmetics;
Hard coating, anti-reflective coating, filter coating;
Medicine and medical devices;
Optical thin films, TiO2, SiO2, Ta2O5;
Semiconductor compounds;
Functional films (MEMS/MOEMS);
Amorphous silicon, nanocrystalline silicon, crystalline silicon;

Measuring range: 20 nm to 50 μm (Thickness only),
100 nm to 10 μm (Thickness with n and k);

Multi-layer measurement: Up to 4 layers;

Light spot size adjustment range: 0.8 mm to 1 cm;

Film thickness measurement accuracy: ±0.5%;

Thickness measurement repeatability: 0.1nm;

Sample stage size: 200 mm × 200 mm;

*Measurement of substrate refractive index and extinction coefficient;

*Film thickness measurement, average value and standard deviation analysis;

*Measurement of thin film refractive index and extinction coefficient;

*Applicable to films, coatings and substrates of different materials and thicknesses;

*Test data output and loading;

* Direct patterned or characteristic structure specimen testing;

*Can be used for real-time online film thickness and refractive index monitoring;

* Wavelength range is optional;

*The system is equipped with a powerful optical constant library and material database to facilitate testing and data analysis;