Microspectroscopy film thickness measuring instrument

No.G547BE0386FF40

Excellent cost-performance ratio, low price but can achieve measurement reproducibility similar to that of high-end film thickness gauges.
Chinese-language operating interface, easy to get started and barrier-free communication.
Provide complete measurement teaching, technical support, inspection and calibration and other after-sales services.
Standard samples are used to verify film thickness accuracy and reproducibility to ensure the integrity of the traceability system.
Macro aperture measurement under microscope focus. ?

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Features:

Ø Excellent cost-performance ratio, low price but can achieve measurement reproducibility similar to that of high-end film thickness gauges.

Ø Chinese-language operating interface, easy to get started and barrier-free communication.

Ø Provide complete measurement teaching, technical support, inspection and calibration and other after-sales services.

Ø Standard samples are used to verify film thickness accuracy and reproducibility to ensure the integrity of the traceability system.

Ø Macro aperture measurement under microscope focus.

Specifications:

Measurement specifications
Film thickness range	200nm~20 μ m
Wavelength range	400nm~780nm
Film thickness accuracy	± Within 1nm
Repeatability (2σ)	Within 0.5nm
Optional products
Sample stage size	200mm × Customizable within 200mm
Measuring aperture (10x objective lens)	Φ 20 μ m. Φ 40 μ m. Φ 60 μ m
Computer equipment	A laptop or desktop computer that supports at least three USB ports
Operating System	Windows XP/7 (32bit)
Measuring objective	5x, 10x, 20x
Software Features
Membrane analysis	N: refractive index, k: absorption coefficient
Film thickness measurement method	FFT method, peak-trough method, curve approximation method (Fitting)

Applications:

Semiconductor wafer film, FPD film material, resin film, photoresist film, oxide film, packaging film, optical coating, anti-reflective film, transparent or semi-transparent film layer

Application examples:

99.4nm SiO on Si substrate 2 membrane
1018.2nm SiO on Si substrate 2 membrane

Shanghai Sales + Technical Support + After-sales Service Center
Rayscience Optoelectronic Innovation Co., Ltd
address: 4th Floor, Building 122, Lane 2338, No. 1 Duhui Road, Minhang District, Shanghai
Telephone: 021-34635258 021-34635259
fax: 021-34635260
E-mail: saleschina@rayscience.com

Microspectroscopy film thickness measuring instrument

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