• Film thickness measuring instrument
  • Film thickness measuring instrument

Film thickness measuring instrument

No.G54783B57F24A4
Measurement range from thin film to thick film, UV~NIR spectral analysis.
High performance and low price optical thin film measuring instrument.
The film thickness was analyzed by absolute reflectance spectroscopy.
It fully inherits 90% of the powerful functions of the high-end FE-3000 model.
No complicated settings, simple operation, you can get started in a short time.
Nonlinear least squares method to analyze optical constants (n: refractive index, k: extinction coefficient)
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  • Film thickness measuring instrument
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Features:

Ø Measurement range from thin film to thick film, UV~NIR spectral analysis.

Ø High performance and low price optical thin film measuring instrument.

Ø The film thickness was analyzed by absolute reflectance spectroscopy.

Ø It fully inherits 90% of the powerful functions of the high-end FE-3000 model.

Ø No complicated settings, simple operation, you can get started in a short time.

Ø The optical constants (n: refractive index, k: extinction coefficient) were analyzed by nonlinear least square method.

Specifications:

model

FE-300V

FE-300UV

FE-300NIR

Corresponding film thickness

Standard

Film type

Thick film type

Ultra thick film type

Sample size

Maximum 8-inch wafer (5mm thickness)

Film thickness range

100nm~40μm

10nm~20 μm

3 μm ~30 μm

15 μm ~1.5mm

Wavelength range

450nm~780nm

300nm~800nm

900nm~1600nm

1470nm~1600nm

Film thickness accuracy

± Within 0.2nm

± Within 0.2nm

-

-

Repeatability (2σ)

Within 0.1nm

Within 0.1nm

-

-

Measuring time

Within 0.1s~10s

Measuring aperture

about Φ3mm

light source

Halogen lamp

UV with D 2 lamp

Halogen lamp

Halogen lamp

Communication interface

USB

Dimensions and weight

280 (W) ×570 (D) ×350 (H) mm, about 24 kg

Software Features

Standard Features

Peak and valley analysis, FFT analysis, optimization analysis, least squares analysis

Optional functions

Material analysis software, thin film model analysis, standard film analysis

Applications:

Ø Semiconductor wafer films (photoresist, SOI, SiO 2 wait)

Ø Optical films (OC films, AR films, ITO, IZO films, etc.)

Application examples:

Ø DLC film on PET substrate

Ø SiNx on Si substrate

Shanghai Sales + Technical Support + After-sales Service Center
Rayscience Optoelectronic Innovation Co., Ltd

address: 4th Floor, Building 122, Lane 2338, No. 1 Duhui Road, Minhang District, Shanghai
Telephone:
021-34635258 021-34635259
fax:
021-34635260
E-mail:
saleschina@rayscience.com

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