Ellipsometer with multi-channel spectrometry over 400 wavelengths, high-speed measurement of ellipsometry spectra. Automatically changing the reflection measurement angle can obtain more detailed thin film analysis data. The sine-bar automatic drive method is adopted to show excellent movement accuracy when measuring angle changes. Equipped with the full-angle simultaneous measurement function required for thin film analysis. The optical constants (n: refractive index, k: extinction coefficient) of wafers and metal surfaces can be measured.
