Ellipsometry measures the ellipsometric parameters of light from ultraviolet to visible wavelengths. Measurement of nano-level optical film thickness above 0.1nm. Ellipsometer with multi-channel spectrometry over 400 wavelengths, high-speed measurement of ellipsometry spectra. The reflection measurement angle can be freely changed to obtain more detailed film analysis data. Nonlinear least squares method to analyze multilayer films and optical constants.
Ø Ellipsometry measures the ellipsometric parameters of light from ultraviolet to visible wavelengths.
Ø Measurement of nano-level optical film thickness above 0.1nm.
Ø Ellipsometer with multi-channel spectrometry over 400 wavelengths, high-speed measurement of ellipsometry spectra.
Ø The reflection measurement angle can be freely changed to obtain more detailed film analysis data.
Ø Nonlinear least squares method to analyze multilayer films and optical constants.
Specifications:
Film thickness measurement range
0.1nm~
Wavelength measurement range
250~800nm (350~1000nm optional)
Photosensitive element
Photodiode array 512ch (electronic cooling)
Incident/reflected angle range
45～90 o
Power specifications
AC1500VA (Fully automatic)
size
1300 (H) ×900 (D) ×1750（W）mm
weight
About 350kg (fully automatic type)
Applications:
■Semiconductor wafers ・Transistor gate oxide film, nitride film, electrode materials, etc. ・SiO 2, SixOy, SiN, SiON, SiNx, Al 2 O 2, SiNxOy, poly-Si, ZnSe, BPSG, TiN ・Photoresist optical constants (wavelength dispersion) ■Compound semiconductors ・AlxGa (1-x) As multilayer film, amorphous silicon ■Flat-panel display ・Alignment film ・ITO, MgO, etc. for plasma displays New materials ・Diamond-like carbon film (DLC film), superconducting film, magnetic head film ■Optical film ・TiO 2, SiO 2, multilayer films, anti-reflection films, reflective films ■Lithographic printing field ・Evaluation of n and k values for g-line (436nm), h-line (405nm), i-line (365nm), KrF (248nm) and other wavelengths
Application examples:
Nonlinear least square method to confirm the accuracy of NIST standard sample (SiO 2) film thickness
Shanghai Sales + Technical Support + After-sales Service Center Rayscience Optoelectronic Innovation Co., Ltd address: 4th Floor, Building 122, Lane 2338, No. 1 Duhui Road, Minhang District, Shanghai Telephone: 021-34635258 021-34635259 fax: 021-34635260 E-mail: saleschina@rayscience.com
