Reflective film thickness measuring instrument

Features:

Ø Non-contact, non-destructive optical interferometry film thickness meter.

Ø High-precision and high-reproducibility measurement of reflectance spectra from ultraviolet to near-infrared wavelengths, analysis of multilayer film thickness, optical constants ( n: refractive index, k: extinction coefficient).

Ø Wide wavelength measurement range. (190nm-1100nm)

Ø The film thickness measurement range is from thin film to thick film. 1nm~250μm ）

Ø Corresponding to the macro measurement aperture under the microscope.

Specifications:

Applications:

Ø FPD

-LCD, TFT, OLED (organic EL)

Ø Semiconductors, compound semiconductors

-Silicon semiconductors, semiconductor lasers, strong dielectric constants, dielectric constant materials

Ø Data Storage

-DVD, magnetic head film, magnetic materials

Ø Optical Materials

-Optical filters, anti-reflective films

Ø Flat Panel Display

-LCD, TFT, OLED

Ø film

-AR film

Ø other

-Building materials

Measuring range:

Analysis of Titanium Dioxide Film Thickness and Film Quality on Glass