• Thin Film Stress & Wafer Bow (Warp) Test System
  • Thin Film Stress & Wafer Bow (Warp) Test System

Thin Film Stress & Wafer Bow (Warp) Test System

No.G546B1A8FECD36
Thin Film Stress & Wafer Bow (Warp) Test System
Film Stress & Wafer Bow Measurement System
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Thin Film Stress & Wafer Bow (Warp) Test System
Film Stress & Wafer Bow Measurement System
After thin film deposition, as the temperature decreases, stress and bending (warping) occur due to the difference in thermal expansion coefficients between the substrate and the film. FSM integrates the world's leading non-destructive laser scanning technology, scanning 40 data points per millimeter, and can quickly produce 2D and 3D color images.
Room temperature system FSM 128 Maximum sample diameter 200mm
FSM 128L Maximum sample diameter 300mm
FSM 128G Maximum sample size: 550×650mm
Variable Temperature System FSM 500TC Resistance heating table: temperature controllable, up to 500℃
FSM 900TC-vac RTP chamber: temperature controllable, up to 900°C (optional 1100°C); vacuum up to 1E-6 Torr
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Rayscience Optoelectronic Innovation Co., Ltd

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Telephone:
021-34635258 021-34635259
fax:
021-34635260
E-mail:
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