• In-Line PECVD system for HIT junctions In-Line PECVD system for HIT junctions
  • In-Line PECVD system for HIT junctions In-Line PECVD system for HIT junctions
  • In-Line PECVD system for HIT junctions In-Line PECVD system for HIT junctions
  • In-Line PECVD system for HIT junctions In-Line PECVD system for HIT junctions

In-Line PECVD system for HIT junctions In-Line PECVD system for HIT junctions

No.G53D5F2EE9F783
In-Line PECVD system for HIT junctions
Linear plasma chemical vapor deposition system for the preparation of high-efficiency heterojunction solar cells
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  • In-Line PECVD system for HIT junctions In-Line PECVD system for HIT junctions
  • In-Line PECVD system for HIT junctions In-Line PECVD system for HIT junctions
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In-Line PECVD system for HIT junctions
Linear plasma chemical vapor deposition system for the preparation of high-efficiency heterojunction solar cells
Throughput: 18 wafers (6”)/cycle
Productivity: 18 6-inch silicon wafers/hour
Shanghai Sales + Technical Support + After-sales Service Center
Rayscience Optoelectronic Innovation Co., Ltd

address: 4th Floor, Building 122, Lane 2338, No. 1 Duhui Road, Minhang District, Shanghai
Telephone:
021-34635258 021-34635259
fax:
021-34635260
E-mail:
saleschina@rayscience.com

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