MVSystems, Inc. was founded in 1989 by Dr. Arun Madan.
Dr. Manden studied under Professor Walter Spear at the University of Dundee in the UK and was one of the first people to conduct research on amorphous silicon materials and devices in the 1970s.
▪ Dr. Manden conducted groundbreaking research on amorphous silicon thin film transistors (TFTs), which was one of the main contents of his doctoral dissertation. Amorphous silicon thin film transistors have now become an indispensable and important device in flat panel displays.
▪The company holds 14 patents in thin film semiconductor technology and advanced high vacuum semiconductor thin film deposition equipment, including:
▪Multi-chamber PECVD deposition systems – Main products ▪Reel-to-reel multi-chamber systems for flexible substrates – Main products
Carbon hot wire chemical vapor deposition equipment Fluorine-doped nanosilicon (microcrystalline silicon) materials
▪P-type wide bandgap amorphous silicon material ▪Fluorine-doped tin dioxide velvet transparent conductive film (cooperated with Asahi Corporation of Japan)
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▪More than 80 equipments manufactured by the company have been sold to 23 countries and regions around the world.
The company's main thin film materials and device products include:
Zinc oxide (AZO), indium tin oxide (ITO), tin dioxide (SnO2)
X-ray detectors
MV Systems designs, manufactures and supplies a variety of single-chamber and multi-chamber thin film deposition equipment. In addition, according to user needs, various
PECVD, HWCVD, and PVD chambers can be manufactured individually or equipped to existing cluster (star) or linear deposition systems. Our company's engineering design department takes users into consideration as much as possible to enable users to obtain the equipment they need most and at the right price.
R&D Cluster tools
•Cluster tool w/ 8 port locations
Cluster deposition system with 8 chambers
•15.6x15.6cm substrates
Substrate size is 15.6x15.6cm
•Computer controlled
Can be fully controlled by computer program operation
•PECVD, HWCVD and Sputter capability
Preparation methods include plasma and hot wire chemical vapor deposition, and sputtering
Shanghai Sales + Technical Support + After-sales Service Center Rayscience Optoelectronic Innovation Co., Ltd address: 4th Floor, Building 122, Lane 2338, No. 1 Duhui Road, Minhang District, Shanghai Telephone: 021-34635258 021-34635259 fax: 021-34635260 E-mail: saleschina@rayscience.com
